发明名称 |
MULTIPLE COMPLEMENTARY GAS DISTRIBUTION ASSEMBLIES |
摘要 |
Described herein are exemplary apparatuses having multiple gas distribution assemblies in accordance with one embodiment. In one embodiment, the apparatus includes two or more gas distribution assemblies. Each gas distribution assembly has orifices through which at least one process gas is introduced into a processing chamber. The two or more gas distribution assemblies may be designed to have complementary characteristic radial film growth rate profiles.
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申请公布号 |
US2013098455(A1) |
申请公布日期 |
2013.04.25 |
申请号 |
US201213649488 |
申请日期 |
2012.10.11 |
申请人 |
NG TUOH-BIN;MELNIK YURIY;PANG LILY L.;TUNCEL EDA;CHEN LU;NGUYEN SON T. |
发明人 |
NG TUOH-BIN;MELNIK YURIY;PANG LILY L.;TUNCEL EDA;CHEN LU;NGUYEN SON T. |
分类号 |
C23C16/455 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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