A METHOD OF DETERMINING FOCUS CORRECTIONS, LITHOGRAPHIC PROCESSING CELL AND DEVICE MANUFACTURING METHOD
摘要
Disclosed is a method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises: exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from said interfield focus variation information.
申请公布号
WO2013029957(A3)
申请公布日期
2013.04.25
申请号
WO2012EP65599
申请日期
2012.08.09
申请人
ASML NETHERLANDS B.V.;KISTEMAN, AREND;KIERS, ANTOINE;TEL, WIM;THEEUWES, THOMAS
发明人
KISTEMAN, AREND;KIERS, ANTOINE;TEL, WIM;THEEUWES, THOMAS