| 摘要 |
PURPOSE: A linear atomic layer deposition device is provided to depose a material on a substrate by linearly moving a substrate with respect to a reactor positioned on the substrate. CONSTITUTION: A linear atomic layer deposition device(100) comprises a plurality of reactors(130), a susceptor(120), and one or more components. A component moves the susceptor in between a first end point and a second end point. The width of the reactors in the susceptor is twice or much longer than a substrate. One or more susceptors are injected in the position of the first and second end point for positioning on the route of a raw material precursor or reaction precursor.
|
