发明名称 COMPOSITION FOR PATTERN ALIGNMENT LAYER AND MANUFACTURING METHOD OF PATTERN ALIGNMENT FILM AND PATTERN RETARDATION FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a composition for a pattern alignment layer excellent in both optical alignment and adhesion to a TAC base material. <P>SOLUTION: A composition for a pattern alignment layer contains an optical alignment material exhibiting optical alignment by polarized light irradiation, solvent dissolving the optical alignment material and polyfunctional acrylate. Pentaerythritol tetraacrylate or the like is referred to as an example of the polyfunctional acrylate. It is preferable that its content be 10 pts.mass or more and less than 30 pts.mass with respect to the content of 100 pts.mass of the optical alignment material. A pattern alignment film 1 is formed by applying the composition for a pattern alignment layer on a base material 11, subsequently heating and drying the composition and, further, forming a pattern alignment layer 12 having different optical alignment by polarized light pattern irradiation. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013076762(A) 申请公布日期 2013.04.25
申请号 JP20110215403 申请日期 2011.09.29
申请人 DAINIPPON PRINTING CO LTD 发明人 INOMATA HIROYA;USUKI HIDEKI;KASHIMA KEIJI;YAMADA KAZUKI
分类号 G02B5/30;G02F1/13;G02F1/13363 主分类号 G02B5/30
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