| 摘要 |
A metal oxide metal (MOM) capacitor includes an outer conducting structure defined in a plurality of metal layers and a plurality of via layers of an integrated circuit including first opposing side walls, second opposing side walls, a cavity with first and second openings, and openings in the first opposing side walls. An inner conducting structure is defined in the plurality of metal layers and the plurality of via layers of the integrated circuit. The inner conducting structure is arranged in the cavity of the outer conducting structure and includes a body, and conducting extensions that extend from the body through the openings in the first opposing side walls. Oxide is arranged between the outer conducting structure and the inner conducting structure. |
