| 发明名称 |
RUTHENIUM COMPOUND HAVING EXCELLENT STEP COVERAGE, AND THIN FILM DEPOSITED USING SAME |
| 摘要 |
<p>The present invention relates to a ruthenium compound that includes a specific ligand structure of 1-ethyl-1,4-cyclohexadienedione, 1,3-butadiene, or isoprene, and has excellent thermal stability, vaporizing properties and step coverage, and also relates to a thin film deposited using the ruthenium compound.</p> |
| 申请公布号 |
WO2013058451(A1) |
申请公布日期 |
2013.04.25 |
| 申请号 |
WO2012KR02390 |
申请日期 |
2012.03.30 |
| 申请人 |
HANSOL CHEMICAL CO., LTD.;PARK, JUNG WOO;KIM, JUN YOUNG;LEE, KWANG DEOK;JIN, WHEE WON |
发明人 |
PARK, JUNG WOO;KIM, JUN YOUNG;LEE, KWANG DEOK;JIN, WHEE WON |
| 分类号 |
C07F15/00;C23C16/18;C23C16/44 |
主分类号 |
C07F15/00 |
| 代理机构 |
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