DIRECT LIQUID DEPOSITION

摘要

Liquid precursor material of a coating substance and a solvent is provided in a reservoir. In one variant the liquid precursor material is distilled, the resultant liquid coating substance is vaporized and ejected through a vapour distribution nozzle arrangement (7) into a vacuum recipient (3) and onto a substrate (5) to be coated. Alternatively, the liquid precursor material is directly vaporized. From the two-component vapour coating substance vapour is applied to the substrate (5') to be coated. In this variant separation of solvent vapour and coating substance vapour is performed especially downstream vaporizing. The vapour distribution nozzle arrangement has a vapour input (474) at the apex of a recessed vapour distribution element (470) and a single surface deflection element (476) directing the vapour to the walls (478) of the recess (472).