发明名称 APPARATUS AND METHOD FOR MANUFACTURING FINE PATTERN USING INTERFEROGRAM OF OPTICAL AXIS DIRECTION
摘要 <p>The present invention relates to a fine pattern manufacturing apparatus using interference and a fine pattern manufacturing method using the fine pattern manufacturing apparatus, which can improve height direction resolution in a laser irradiation method. More specifically, the invention relates to a fine pattern manufacturing apparatus using interference and a fine pattern manufacturing method using the manufacturing apparatus, in which a height direction interference generation unit is included to interfere laser beams respectively having a different plane direction width, and height direction line width can be improved by irradiating an interference laser beam having an interference fringe direction of height direction on a photosensitive film.</p>
申请公布号 WO2013058471(A1) 申请公布日期 2013.04.25
申请号 WO2012KR05899 申请日期 2012.07.24
申请人 KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE;RHEE, HYUG-GYO;LEE, YUN WOO 发明人 RHEE, HYUG-GYO;LEE, YUN WOO
分类号 G03F7/20;G03F7/26;H01L21/027 主分类号 G03F7/20
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