发明名称 |
APPARATUS AND METHOD FOR MANUFACTURING FINE PATTERN USING INTERFEROGRAM OF OPTICAL AXIS DIRECTION |
摘要 |
<p>The present invention relates to a fine pattern manufacturing apparatus using interference and a fine pattern manufacturing method using the fine pattern manufacturing apparatus, which can improve height direction resolution in a laser irradiation method. More specifically, the invention relates to a fine pattern manufacturing apparatus using interference and a fine pattern manufacturing method using the manufacturing apparatus, in which a height direction interference generation unit is included to interfere laser beams respectively having a different plane direction width, and height direction line width can be improved by irradiating an interference laser beam having an interference fringe direction of height direction on a photosensitive film.</p> |
申请公布号 |
WO2013058471(A1) |
申请公布日期 |
2013.04.25 |
申请号 |
WO2012KR05899 |
申请日期 |
2012.07.24 |
申请人 |
KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE;RHEE, HYUG-GYO;LEE, YUN WOO |
发明人 |
RHEE, HYUG-GYO;LEE, YUN WOO |
分类号 |
G03F7/20;G03F7/26;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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