发明名称 MULTI-TRANSISTOR
摘要 <p>The present invention relates to a multi-transistor and a method of manufacturing same. The multi-transistor according to an embodiment of the present invention includes: a first transistor including a gate, a first source formed on one side of the gate, and a first drain formed on the other side of the gate; and a second transistor including a second drain formed oppositely to the first source and on the one side of the gate on a substrate, and a second source formed oppositely to the first drain and on the other side of the gate, so as to minimize parasite inductance components occurring between opposite transistors.</p>
申请公布号 WO2013058447(A1) 申请公布日期 2013.04.25
申请号 WO2012KR02081 申请日期 2012.03.22
申请人 SOONGSIL UNIVERSITY RESEARCH CONSORTIUM TECHNO-PARK;PARK, JONG-HOON;PARK, CHANG-KUN 发明人 PARK, JONG-HOON;PARK, CHANG-KUN
分类号 H01L27/085 主分类号 H01L27/085
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