<p>The present invention relates to a multi-transistor and a method of manufacturing same. The multi-transistor according to an embodiment of the present invention includes: a first transistor including a gate, a first source formed on one side of the gate, and a first drain formed on the other side of the gate; and a second transistor including a second drain formed oppositely to the first source and on the one side of the gate on a substrate, and a second source formed oppositely to the first drain and on the other side of the gate, so as to minimize parasite inductance components occurring between opposite transistors.</p>
申请公布号
WO2013058447(A1)
申请公布日期
2013.04.25
申请号
WO2012KR02081
申请日期
2012.03.22
申请人
SOONGSIL UNIVERSITY RESEARCH CONSORTIUM TECHNO-PARK;PARK, JONG-HOON;PARK, CHANG-KUN