<p>This method for producing a perforated metal foil includes: a conductive substrate preparation step (S20) for preparing a conductive substrate having a structure such that an insulating layer has been formed at a second region corresponding to the position of a perforation; a metal foil formation step (S30) for forming a metal foil by means of electrodeposition at a first region that is of the conductive substrate and to which the insulating layer has not been formed; an insulating layer elimination step (S40) for eliminating the insulating layer; and a metal foil peeling step (S50) for peeling the metal foil from the conductive substrate. By means of the method for producing a perforated metal foil, degradation of perforation shape and perforation dimensions during the production process are eliminated and so it is possible to stably produce a high-quality perforated metal foil.</p>
