发明名称 |
LARGE-SIZED PHASE-SHIFT MASK, AND METHOD FOR PRODUCING LARGE-SIZED PHASE-SHIFT MASK |
摘要 |
<p>Provided are: a phase-shift mask which is a large-sized photomask that enables the exposure of a large-sized area to light and has a constitution suitable for the formation of a fine pattern; and a method for producing the phase-shift mask. A large-sized phase-shift mask is produced, which can be produced easily and enables the transfer of a fine pattern. The large-sized phase-shift mask has such a constitution that a light-shielding film contains chromium or a chromium compound as the main component, a phase-shift film contains chromium oxide or oxidized chromium nitride as the main component, and the phase-shift film is laminated on the light-shielding film in the light-shielding area. The reflectance of the light-shielding area can be reduced by employing such a constitution that an anti-reflective film comprising a chromium compound is additionally provided between the light-shielding film and the phase-shift film.</p> |
申请公布号 |
WO2013058385(A1) |
申请公布日期 |
2013.04.25 |
申请号 |
WO2012JP77157 |
申请日期 |
2012.10.19 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
KINOSHITA, KAZUKI;TOBITA, ATSUSHI;NISHIMA, SATORU |
分类号 |
G03F1/26;G03F1/46 |
主分类号 |
G03F1/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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