发明名称 |
APPARATUS FOR COATING PARYLENE THIN FILM AND METHOD FOR COATING PARYLENE THIN FILM USING THE APPARATUS |
摘要 |
PURPOSE: A device for coating a parylene thin film and a coating method using the same are provided to produce a parylene thin film into a uniform thickness without controlling the content of parylene dimer for introducing to an evaporation part or the deposition time of the parylene thin film in a deposition chamber. CONSTITUTION: A device for coating a parylene thin film and a coating method using the same comprises an evaporation part(30), a thermal decomposition part(20), and a deposition chamber(10). The evaporation part evaporates parylene monomer. The thermal decomposition part thermally decomposes the evaporated parylene dimer gas. The deposition chamber forms a parlylene thin film by depositing an intermediate product which is thermally decomposed to a substrate. The deposition chamber comprises a QCM(Quartz Crystal Microbalance) sensor formed inside the deposition chamber. [Reference numerals] (10) Deposition chamber; (20) Thermal decomposition part; (30) Evaporation part; (40) Vacuum pump; (AA) Monitoring unit; (BB) Control unit; (CC) Power supply;
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申请公布号 |
KR20130041454(A) |
申请公布日期 |
2013.04.25 |
申请号 |
KR20110105695 |
申请日期 |
2011.10.17 |
申请人 |
INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY |
发明人 |
PYUN, JAE CHUL |
分类号 |
C23C16/44;C08J5/18;C23C14/12 |
主分类号 |
C23C16/44 |
代理机构 |
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