发明名称 APPARATUS FOR COATING PARYLENE THIN FILM AND METHOD FOR COATING PARYLENE THIN FILM USING THE APPARATUS
摘要 PURPOSE: A device for coating a parylene thin film and a coating method using the same are provided to produce a parylene thin film into a uniform thickness without controlling the content of parylene dimer for introducing to an evaporation part or the deposition time of the parylene thin film in a deposition chamber. CONSTITUTION: A device for coating a parylene thin film and a coating method using the same comprises an evaporation part(30), a thermal decomposition part(20), and a deposition chamber(10). The evaporation part evaporates parylene monomer. The thermal decomposition part thermally decomposes the evaporated parylene dimer gas. The deposition chamber forms a parlylene thin film by depositing an intermediate product which is thermally decomposed to a substrate. The deposition chamber comprises a QCM(Quartz Crystal Microbalance) sensor formed inside the deposition chamber. [Reference numerals] (10) Deposition chamber; (20) Thermal decomposition part; (30) Evaporation part; (40) Vacuum pump; (AA) Monitoring unit; (BB) Control unit; (CC) Power supply;
申请公布号 KR20130041454(A) 申请公布日期 2013.04.25
申请号 KR20110105695 申请日期 2011.10.17
申请人 INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY 发明人 PYUN, JAE CHUL
分类号 C23C16/44;C08J5/18;C23C14/12 主分类号 C23C16/44
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