| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a gas supply device which can introduce a stabilized flow rate of gas into a treatment vessel without making the gas flow to the side of a vent pipe. <P>SOLUTION: The gas supply device 40 which supplies a gas into a treatment vessel 4 storing a workpiece W to be deposited with a thin film is provided with a gas supply system 42 including: a gas passage 48 connected to the treatment vessel and through which a gas is made to flow; a flow rate control valve 64 inserted in the gas passage; an on-off valve mechanism 68 inserted in the gas passage on the downstream side than the flow rate control valve; a pressure detection part 74 of detecting the pressure in an intermediate gas passage 72 as a gas passage between the flow rate control valve and the on-off valve mechanism; and a valve control part 76 of controlling the pressure in the intermediate gas passage so as to be a fixed value of two or more times the pressure in the treatment vessel by controlling the flow rate control valve based on the detection of the pressure detection part. <P>COPYRIGHT: (C)2013,JPO&INPIT |
