| 发明名称 |
ELECTRON BEAM PLASMA SOURCE WITH PROFILED CHAMBER WALL FOR UNIFORM PLASMA GENERATION |
| 摘要 |
A plasma reactor that generates plasma in a workplace processing chamber by an electron beam, has an electron beam source chamber with a wall opposite to the electron beam propagation direction, the wall being profiled to compensate for a non-uniformity in electron beam density distribution.
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| 申请公布号 |
US2013098553(A1) |
申请公布日期 |
2013.04.25 |
| 申请号 |
US201213595351 |
申请日期 |
2012.08.27 |
| 申请人 |
BERA KALLOL;COLLINS KENNETH S.;RAUF SHAHID;DORF LEONID;APPLIED MATERIALS, INC. |
发明人 |
BERA KALLOL;COLLINS KENNETH S.;RAUF SHAHID;DORF LEONID |
| 分类号 |
C23F1/08 |
主分类号 |
C23F1/08 |
| 代理机构 |
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代理人 |
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