POWDER, SINTERED BODY AND SPUTTERING TARGET, EACH CONTAINING ELEMENTS OF CU, IN, GA AND SE, AND METHOD FOR PRODUCING THE POWDER

摘要

The present invention provides a Cu-In-Ga-Se powder containing Cu, In, Ga and Se in which cracks do not occur during sintering or processing, and a sintered body and sputtering target, each using the same. The present invention relates to a powder containing Cu, In Ga and Se, which contains a Cu-In-Ga-Se compound and/or a Cu-In-Se compound in an amount of 60 mass % or more in total. The powder of the present invention preferably contains an In-Se compound in an amount of 20 mass % or less and/or a Cu-In compound in an amount of 20 mass % or less.