| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound used to form a resist film excellent in nanoedge roughness, resolution ratio, pattern collapse resistance and MEEF (Mask Error Enhancement Factor) in addition to fundamental performance such as sensitivity, a polymer obtained by using the compound and a photoresist composition including the polymer. <P>SOLUTION: The compound is shown by formula (1), (wherein R<SP POS="POST">1</SP>represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R<SP POS="POST">2</SP>represents a single bond or a bivalent bond group. M<SP POS="POST">+</SP>represents a univalent cation), and the univalent cation M<SP POS="POST">+</SP>in formula (1) is preferably a sulfonium such as 4-cyclohexylthiophenyl diphenylsulfonium. <P>COPYRIGHT: (C)2013,JPO&INPIT |
