发明名称 |
ELECTRON BEAM PLASMA SOURCE WITH PROFILED CONDUCTIVE FINS FOR UNIFORM PLASMA GENERATION |
摘要 |
In a plasma reactor employing a planar electron beam as a plasma source, the electron beam source chamber has an internal conductive fin that is profiled along a direction transverse to the beam propagation diction and parallel to the plane of the electron beam, in order to correct electron beam density distribution.
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申请公布号 |
US2013098555(A1) |
申请公布日期 |
2013.04.25 |
申请号 |
US201213595612 |
申请日期 |
2012.08.27 |
申请人 |
BERA KALLOL;RAUF SHAHID;AGARWAL ANKUR;APPLIED MATERIALS, INC. |
发明人 |
BERA KALLOL;RAUF SHAHID;AGARWAL ANKUR |
分类号 |
H05H1/46 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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