发明名称 BONDED SUBSTRATE AND MANUFACTURING MOTHOD THEREOF
摘要 PURPOSE: A bonded substrate and a manufacturing method thereof are provided to remove the empty space between a first and a second substrate and improve the bonding quality of the first and the second substrate. CONSTITUTION: An ion is injected into a first substrate to form an ion implantation layer(S110). The first substrate is bonded to a second substrate having grooves(S120). The first substrate is separated based on the ion implantation layer(S130). The ion is hydrogen, helium, nitrogen, oxygen, or argon. [Reference numerals] (S110) Injecting ions into a first substrate; (S120) Bonding the first substrate to a second substrate having grooves; (S130) Separating the first substrate based on the ion implantation layer;
申请公布号 KR20130040496(A) 申请公布日期 2013.04.24
申请号 KR20110105310 申请日期 2011.10.14
申请人 SAMSUNG CORNING PRECISION MATERIALS CO., LTD. 发明人 SHUR, JOONG WON;KIM, DONG HYUN;KIM, DONG WOON;KIM, MI KYOUNG;KIM, MIN JU;PARK, SEUNG YONG;LEE, BO HYUN;JANG, BONG HEE
分类号 H01L21/20 主分类号 H01L21/20
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