LASER CRYSTALLIZATION APPARATUS AND LASER CRYSTALLIZATIO METHOD USING THE SAME

摘要

PURPOSE: A laser crystallizing apparatus and a laser crystallizing method are provided to reduce a spot defect by determining an oscillation frequency in consideration of a laser beam width, a laser scan pitch, a laser oscillation frequency, and a distance between adjacent thin film transistor forming units. CONSTITUTION: A laser crystallizing apparatus includes an oscillating device. The oscillating device oscillates a laser beam in a long axis direction of the laser beam of a line shape. An oscillation frequency satisfies F<(P x f)/(2 x W). The F is a mirror oscillation frequency. The W is a laser beam width. The P is a laser scan pitch. The f is a laser oscillation frequency. [Reference numerals] (AA) Abnormal part; (BB) Beam; (CC) Beam width : W; (DD) Scan pitch : P;