| 摘要 |
<p>The present invention relates to a MEMS microphone and to a method for manufacturing same, which are capable of precisely forming a gap between a membrane and a back plate by forming an air-gap-forming portion on a silicon substrate and then depositing the membrane and back plate thereon. Also, according to the MEMS microphone and method for manufacturing same, by manufacturing the membrane and/or back plate using an electroless plating process, the planarizing process of a sacrificial layer can be simplified, and reducing and controlling residual stress can be rendered easy. The MEMS microphone according to the present invention comprises: a silicon substrate defining a back chamber and an air-gap-forming portion formed by means of etching into a top of the back chamber up to a predetermined depth; a membrane deposited on the air-gap-forming portion of the silicon substrate or on the silicon substrate; and a back plate deposited on the air-gap-forming portion or on the silicon substrate so as to be separated from the membrane and to form a gap with the membrane for an air gap.</p> |
