| 摘要 |
PURPOSE: An aromatic ring-containing polymer is provided to ensure anti-reflection, mechanical property, and etching selectivity and to use in a composition for resist lower layer. CONSTITUTION: An aromatic ring-containing polymer contains a repeat unit of chemical formula 1. In chemical formula 1, R1-R4 are same or different hydrogen, hydroxyl group, halogen group, substituted or non-substituted alkyl group, substituted or non-substituted aryl group, substituted or non-substituted halogen group, substituted or non-substituted heteroaryl group, substituted or non-substituted alkoxy group, substituted or non-substituted aldehyde group, and substituted or non-substituted amino group; R5 is selected from a group consisting of substituted or non-substituted alkyl group, substituted or non-substituted aryl group, or substituted or non-substituted heteroaryl group; and L is selected from a group consisting of hydroxyl group, halogen group, substituted or non-substituted alkoxy group, substituted or non-substituted aldehyde group, ester group, amide group, sulfone ester, and substituted or non-substituted amino group. |
