发明名称 IMPRINT METHOD, IMPRINT APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <p>PURPOSE: An imprinting method, an imprinting apparatus, and a method for manufacturing a device are provided to improve overlap precision between a mold and a resin of a substrate by deforming a pattern region of a substrate side through a heating process. CONSTITUTION: A substrate is maintained on a maintaining surface. A pattern region of a substrate side is deformed. A mold(7) is contacted with a resin(14) on the deformed pattern region of the substrate side. The resin is hardened. The mold is separated from the resin. A deformation force is applied to the substrate along the surface of the substrate. The deformation force is larger than the maximum static friction applied between the maintaining surface and the rear of the substrate corresponding to the pattern region of the substrate side.</p>
申请公布号 KR20130040723(A) 申请公布日期 2013.04.24
申请号 KR20120113294 申请日期 2012.10.12
申请人 CANON KABUSHIKI KAISHA 发明人 NAKAGAWA KAZUKI;HASEGAWA NORIYASU;MURAKAMI YOSUKE;MATSUMOTO TAKAHIRO
分类号 H01L21/027 主分类号 H01L21/027
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