| 摘要 |
PURPOSE: A positive photosensitive resin composition is provided to secure the high-sensitivity and high definition of the composition, to improve he residue elimination property, and to maintain the balance of a solid content of the composition. CONSTITUTION: A positive photosensitive resin composition contains a polybenzoxazole precursor including a recurring unit marked as chemical formula 1, a photosensitive diazoquinone compound, a silane compound, a phenol compound and a solvent. In the chemical formula 1, X1 refers to an aromatic organic group or a quadrivalent-hexavalent aliphatic organic group. X2 refers to the aromatic organic group. Y1 and Y2 are the aromatic organic group or a divalent-hexavalent aliphatic organic group, respectively. |
