发明名称 Process for fabricating a circuit board
摘要 A process for fabricating a circuit board is provided. A circuit substrate having a first surface and a first circuit layer is provided. A first dielectric layer having a second surface is formed on the circuit substrate and covers the first surface and the first circuit layer. An antagonistic activation layer is formed on the second surface. The antagonistic activation layer is irradiated by a laser beam to form at least a blind via extended from the antagonistic activation layer to the first circuit layer and an intaglio pattern. A first conductive layer is formed inside the blind via. A second conductive layer is formed in the intaglio pattern and the blind via. The second conductive layer covers the first conductive layer and is electrically connected with the first circuit layer through the first conductive layer. The antagonistic activation layer is removed to expose the second surface.
申请公布号 US8424202(B2) 申请公布日期 2013.04.23
申请号 US20100783851 申请日期 2010.05.20
申请人 TSENG TZYY-JANG;CHIANG SHU-SHENG;CHEN TSUNG-YUAN;UNIMICRON TECHNOLOGY CORP. 发明人 TSENG TZYY-JANG;CHIANG SHU-SHENG;CHEN TSUNG-YUAN
分类号 H01K3/10 主分类号 H01K3/10
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