发明名称 |
Laser-assisted chemical singulation of a wafer |
摘要 |
The present invention discloses an apparatus including: a laser beam directed at a wafer held by a chuck mounted on a stage inside a process chamber; a focusing mechanism for the laser beam; a steering mechanism for the laser beam; an optical scanning mechanism for the laser beam; a mechanical scanning system for the stage; an etch chemical induced by the laser beam to etch the wafer and form volatile byproducts; a gas feed line to dispense the etch chemical towards the wafer; and a gas exhaust line to remove any excess of the etch chemical and the volatile byproducts. |
申请公布号 |
US8426250(B2) |
申请公布日期 |
2013.04.23 |
申请号 |
US20080288627 |
申请日期 |
2008.10.22 |
申请人 |
VAKANAS GEORGE;CHEN GEORGE;GREENZWEIG YUVAL;LI ERIC;VORONOV SERGEI;INTEL CORPORATION |
发明人 |
VAKANAS GEORGE;CHEN GEORGE;GREENZWEIG YUVAL;LI ERIC;VORONOV SERGEI |
分类号 |
H01L21/78 |
主分类号 |
H01L21/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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