发明名称 |
Thin-film transistor substrate, method of manufacturing same and display apparatus having same |
摘要 |
Contamination is blocked from material of a color filter layer provided on a thin-film transistors (TFT) supporting substrate by sealing over the color filter layer with an inorganic insulating layer. During mass production manufacture, a plasma surface cleaning step is employed after the color filter layer is deposited but before the inorganic insulating layer is deposited. A low temperature CVD process is used to deposit the inorganic insulating layer with a substantially uniform thickness conformably over the color filter layer including conformably into openings provided through the color filter layer. |
申请公布号 |
US8426228(B2) |
申请公布日期 |
2013.04.23 |
申请号 |
US201113181403 |
申请日期 |
2011.07.12 |
申请人 |
RYU HYE-YOUNG;KONG HYANG-SHIK;YANG BYUNG-DUK;JEON KYUNG-SOOK;SAMSUNG DISPLAY CO., LTD. |
发明人 |
RYU HYE-YOUNG;KONG HYANG-SHIK;YANG BYUNG-DUK;JEON KYUNG-SOOK |
分类号 |
H01L29/06;H01L29/08 |
主分类号 |
H01L29/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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