| 发明名称 |
Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference |
| 摘要 |
Methods for fabricating sublithographic, nanoscale microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. |
| 申请公布号 |
US8426313(B2) |
申请公布日期 |
2013.04.23 |
| 申请号 |
US20080052956 |
申请日期 |
2008.03.21 |
| 申请人 |
MILLWARD DAN B.;QUICK TIMOTHY;MICRON TECHNOLOGY, INC. |
发明人 |
MILLWARD DAN B.;QUICK TIMOTHY |
| 分类号 |
H01L21/311 |
主分类号 |
H01L21/311 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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