发明名称 |
Lithographic apparatus and methods |
摘要 |
A system for cleaning a limited area of a top surface of a substrate table or an object positioned on a top surface of a substrate table is disclosed. The optical system used during normal imaging is adjusted to limit the cross-sectional area of a radiation beam to form a cleaning radiation beam which impinges on the limited area. |
申请公布号 |
US8427627(B2) |
申请公布日期 |
2013.04.23 |
申请号 |
US20090398403 |
申请日期 |
2009.03.05 |
申请人 |
KIVITS KOEN;JANSEN HANS;MATIAS SERRAO VASCO MIGUEL;ASML NETHERLANDS B.V. |
发明人 |
KIVITS KOEN;JANSEN HANS;MATIAS SERRAO VASCO MIGUEL |
分类号 |
G03B27/52;G03B27/32 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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