发明名称 MICROWAVE ANTENNA AND SUBSTRATE TREATING APPARATUS INCLUDING THE ANTENNA
摘要 PURPOSE: A microwave antenna is provided to offer a substrate processing apparatus uniformly generating plasma and to uniformly propagate microwave. CONSTITUTION: A microwave antenna(430) exciting processing gas by applying microwave includes a disc shape antenna(431) in which slot holes in which microwave transmit are formed, an antenna rod(433) arranged in the upper part of the antenna in the up-down direction and the lower part thereof is fixed in the center of the antenna, a microwave adaptor(436) arranged in the upper part of the antenna rod and propagating microwave to the antenna rod and an antenna height adjustment unit(445) connecting the microwave adaptor with the antenna rod and moving the antenna rod to change the relative height of the antenna to the microwave adaptor.
申请公布号 KR20130040025(A) 申请公布日期 2013.04.23
申请号 KR20110104756 申请日期 2011.10.13
申请人 SEMES CO., LTD. 发明人 LEE, TAE HYO;KIM, SUN RAE;PARK, YOUNG HAK;CHOI, JIN WOO
分类号 H05H1/46;H01L21/205;H01Q13/10 主分类号 H05H1/46
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