发明名称 Integrated circuit inductor having a patterned ground shield
摘要 An inductor structure can be implemented within a semiconductor integrated circuit (IC). The inductor structure can include a coil of conductive material having a first terminal and a second terminal each located at an opposing end of the coil. The inductor structure can include a patterned ground shield including a plurality of fingers implemented within an IC process layer located between the coil of conductive material and a substrate of the IC. The inductor structure also can include an isolation wall formed to encompass the coil and the patterned ground shield. The isolation wall can be coupled to one end of each finger.
申请公布号 US8427266(B2) 申请公布日期 2013.04.23
申请号 US201113052310 申请日期 2011.03.21
申请人 WU ZHAOYIN D.;UPADHYAHYA PARAG;JIANG XUEWEN;JING JING;WU SHUXIAN;XILINX, INC. 发明人 WU ZHAOYIN D.;UPADHYAHYA PARAG;JIANG XUEWEN;JING JING;WU SHUXIAN
分类号 H01F27/32 主分类号 H01F27/32
代理机构 代理人
主权项
地址