发明名称 METAL FOIL, METHOD FOR PRODUCING SAME, INSULATING SUBSTRATE, AND WIRING BOARD
摘要 Disclosed is a surface-treated metal foil which can be produced at low cost and enables easy formation of an extremely thin electroless plated copper foil, which does not require a sputtering process for forming a fine circuit and is capable of maintaining high adhesion strength, on a substrate surface.  The surface-treated metal foil can provide a replica having a uniform roughening shape with an anchoring effect. Specifically disclosed is a surface-treated metal foil, wherein a roughening bump plating is formed on at least one surface of an untreated metal foil using a burnt plating, and the roughening bump plating is subjected to capsule plating.  The surface-treated metal foil has a surface roughness (Rz) of 1.0-2.5 µm.  The roughening bumps formed in the roughening bump plating have a columnar shape with an interval of not less than 0.1 µm but not more than 1.0 µm between adjacent roughening bumps.  The surface-treated metal foil is most suited for the use as a replica.  The surface-treated metal foil is preferably a copper foil.
申请公布号 KR101256086(B1) 申请公布日期 2013.04.23
申请号 KR20117013392 申请日期 2010.02.12
申请人 发明人
分类号 C25D3/38;C25D7/06;H01B5/02;H05K1/09 主分类号 C25D3/38
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