| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask capable of suppressing the occurrence of exposure unevenness on a substrate. <P>SOLUTION: There is provided a photomask 1, which comprises a light shielding portion 11 for shielding exposure light and a light transmitting portion 12 for transmitting the exposure light and is used for the exposure of an exposure target 2 during conveying in a certain direction A, wherein the length 1 in the conveyance direction A of each portion of the light transmitting portion 12 is determined so that the exposure amount E of an exposure target portion 21 which is exposed through the light transmitting portion 12 is equal over the entire width W in a direction B perpendicular to the conveyance direction A of the exposure target 2. <P>COPYRIGHT: (C)2013,JPO&INPIT |
