| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reflective mask blank, a mask for reflection exposure or a reticle enabling accurate exposure transfer while preventing reflection of light from the region other than a circuit pattern region to be exposed. <P>SOLUTION: A reflective mask blank having a sacrificial film formed partially on the upper side of a substrate, and a multilayer reflection film, a protective film, an absorption film and a back conductive film formed on the substrate is prepared. Subsequently, a circuit pattern and a light-shielding frame region are formed by removing the absorption film of the circuit pattern and the region other than that region selectively. Then, the protective film, the multilayer reflection film and the sacrificial film are removed in two stages of dry etching and wet etching. <P>COPYRIGHT: (C)2013,JPO&INPIT |
