METHOD FOR ADJUSTING EXPOSURE DEVICE, SHAPE MEASUREMENT METHOD AND SHAPE MEASUREMENT DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for adjusting an exposure device in which adjustment is possible with high accuracy.

SOLUTION: A method for adjusting an exposure device includes the steps of: irradiating a mirror surface part of an exposure device having a mirror surface member having a light scattering portion on the mirror surface part with laser beams; calculating distance up to the light scattering portion based on scattering light of laser beams from the light scattering portion of the mirror surface part; determining a shape of the mirror surface based on a calculation step; and adjusting the shape of the mirror surface part based on the determination result. According to such a method, shape recognition of the mirror surface is made possible by light scattering even in the mirror surface part, and the parallelization degree of exposure light can be effectively corrected by adjusting a surface shape of the mirror surface part based on such a method.

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