| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reflective mask and a reflective mask blank that produce less particles and have a light shield mask with cleaning resistance, and methods of manufacturing the same. <P>SOLUTION: The reflective mask having the light shield frame formed by digging a multilayer reflective layer 02 is reduced in production of particles by forming a sidewall protective layer on a side face of the reflective layer by an electrolytic plating method. The mask of the present invention suppresses deterioration of the multilayer reflective layer in a mask cleaning process, and a reflection type mask of high quality can be provided. <P>COPYRIGHT: (C)2013,JPO&INPIT |
