CONDUCTIVE ELEMENT FOR ELECTRICALLY COUPLING EUVL MASK WITH SUPPORT CHUCK

摘要

PROBLEM TO BE SOLVED: To provide a technique for extreme ultraviolet lithography (EUVL) mask inspection by an electron-beam or ion-bem imaging device.

SOLUTION: A coupling module may include an upper portion defining an opening, a mask contact element, a chuck contact element, and an intermediate element connected between the mask contact element and upper portion. The shape and size of the opening may correspond to the shape and size of a pattern transfer section of an extreme ultraviolet (EUVL) mask. The coupling module may have such a shape and a size that while the mask contact element comes into contact with the upper portion of the EUVL mask, the chuck contact element comes into contact with a chuck supporting the EUVL mask. The coupling module further provides at least one conductive path between the upper portion of the EUVL mask and the chuck when the EUVL mask is positioned on the chuck.

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