发明名称 LASER ANNEALING APPARATUS AND LASER ANNEALING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To solve such problems that a general pulse waveform rises sharply from the start point of oscillation and falls gently after peak, surface of an annealed object is heated rapidly at a moment in time of peak power, and since the power shows a peak only momentarily, it is difficult to heat the deep region of the annealed object sufficiently. <P>SOLUTION: When a pulse current is input, a laser pulse is emitted from a laser diode. An optical system guides the laser pulse emitted from the laser diode to an annealed object. A driver supplies a pulse current having a top flat time waveform and a pulse width of 1-100 &mu;s to the laser diode. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013074019(A) 申请公布日期 2013.04.22
申请号 JP20110210590 申请日期 2011.09.27
申请人 SUMITOMO HEAVY IND LTD 发明人 WAKABAYASHI NAOKI;YOROZU MASAFUMI
分类号 H01L21/268;H01L21/02;H01L21/265;H01L21/336;H01L29/78;H01S5/042 主分类号 H01L21/268
代理机构 代理人
主权项
地址