发明名称 |
SILICON-CONTAINING BLOCK CO-POLYMERS, METHODS FOR SYNTHESIS AND USE |
摘要 |
The present invention describes the synthesis of silicon-containing monomers and copolymers. The synthesis of a monomer, trimethyl-(2-methylenebut-3-enyl)silane (TMSI) and subsequent synthesis of diblock copolymer with styrene, forming polystyrene-block-polytrimethylsilyl isoprene, and synthesis of diblock copolymer Polystyrene-block-polymethacryloxymethyltrimethylsilane or PS-b-P(MTMSMA). These silicon containing diblock copolymers have a variety of uses. One preferred application is as novel imprint template material with sub-100 nm features for lithography. |
申请公布号 |
KR20130039727(A) |
申请公布日期 |
2013.04.22 |
申请号 |
KR20127027170 |
申请日期 |
2011.03.17 |
申请人 |
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM |
发明人 |
WILLSON C. GRANT;BATES CHRISTOPHER;STRAHAN JEFFREY;ELLISON CHRISTOPHER;MUELLER BRENNEN |
分类号 |
C08J7/04;C08G77/42;C08J5/18;H01L51/40 |
主分类号 |
C08J7/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|