发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a semiconductor device and a method for manufacturing the same capable of suppressing solder diffusion at low cost and relieving stress. <P>SOLUTION: A semiconductor device comprises: a ground layer 12 provided on a substrate 10; a Ni layer 16 provided on the ground layer 12 by an electroless plating method; and a solder ball 20 provided on the Ni layer 16. In the semiconductor device and the method for manufacturing the same, a second region 16b which is a region on the solder ball 20 side of the Ni layer 16 is harder than a first region 16a which is a region on the ground layer 12 side of the Ni layer 16. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013074174(A) 申请公布日期 2013.04.22
申请号 JP20110212873 申请日期 2011.09.28
申请人 SUMITOMO ELECTRIC DEVICE INNOVATIONS INC 发明人 MATSUDA KEITA
分类号 H01L21/60 主分类号 H01L21/60
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