发明名称 METHOD AND DEVICE FOR INSPECTING SUBSTRATE SURFACE DEFECT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method and a device for inspecting a substrate surface defect, capable of efficiently collecting defect sample data and providing a setting condition with high classification performance. <P>SOLUTION: The device for inspecting a substrate surface defect comprises: inspection optical system means including one or more detectors for detecting light reflected or scattered from a substrate by irradiating, with one or more lights, the substrate to be inspected placed on a rotatable stage means; defect detection means for processing signals obtained by amplifying signals outputted from the one or more detectors and performing A/D conversion thereof to detect a defect on the substrate; output calculating means for performing a scattered light simulation in accordance with a defect detection model to estimate a plurality of detector outputs; and sorter constructing means for constructing a sorter by machine learning of a rule base. The sorter constructing means shows collection of necessary actual defect samples to construct a sorter under a necessary and sufficient condition, on the basis of the sorter obtained by the scattered light simulation. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013072788(A) 申请公布日期 2013.04.22
申请号 JP20110213008 申请日期 2011.09.28
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SASAZAWA HIDEAKI;SERIKAWA SHIGERU;HORIE KIYOTAKE;YANAKA YU
分类号 G01N21/95 主分类号 G01N21/95
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