| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask for reflective exposure enabling accurate exposure transfer while preventing reflection of light from a region other than a circuit pattern region to be exposed. <P>SOLUTION: Reflective mask blanks where a multilayer reflection film, a protective film, an absorption film, and a back conductive film are formed on a substrate containing a material absorbing the light having wavelength not required for exposure are prepared. Subsequently, the absorption film in the circuit pattern and on the region other than that region are removed selectively, thus forming a circuit pattern and a light-shielding frame region. Then, the protective film and the multilayer reflection film are removed in the light-shielding frame region. <P>COPYRIGHT: (C)2013,JPO&INPIT |
