| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask layout division method and mask layout division device that can prevent a yield drop. <P>SOLUTION: A mask layout division method includes steps of: acquiring cell layout data for each of multiple types of cells; setting multiple candidates for a pattern parting section generated when dividing the cell layout into multiple mask layouts, as multiple parting candidates, and generating cell layout data with the parting candidates corresponding to each of the types of cells; generating full-chip layout data showing a layout of full chips including multiple cells, on the basis of the cell layout data with the parting candidates, and selecting a parting candidate group to be adopted from the parting candidates shown in the data; dividing a layout shown in the full-chip layout data, so as to part the pattern at the selected parting candidate group; and generating division layout data showing a division result. <P>COPYRIGHT: (C)2013,JPO&INPIT |
