发明名称 |
SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor device manufacturing method which can improve manufacturing efficiency and a freedom degree in a manufacturing design of the semiconductor device. <P>SOLUTION: A manufacturing method of a semiconductor device including a semiconductor chip 5 comprises: a step of preparing the semiconductor chip on which a conductive member 6 is formed on a first principal surface 5A; a step of preparing a supporting structure 10 in which a radiation curable adhesive layer 3 and a first thermosetting resin layer 1 are laminated on a radiotransparent support medium 4 in this order; a step of arranging a plurality of semiconductor chips on the first thermosetting resin layer such that the first thermosetting resin layer and a second principal surface 5b on the opposite side to the first principal surface of the semiconductor chip face each other; a step of laminating a second thermosetting resin layer 2 on the first thermosetting resin layer so as to cover the plurality of semiconductor chips; and a step of detaching the radiation curable adhesive layer and the first thermosetting resin layer by applying radial rays from the support medium side to cure the radiation curable adhesive layer. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013074184(A) |
申请公布日期 |
2013.04.22 |
申请号 |
JP20110213028 |
申请日期 |
2011.09.28 |
申请人 |
NITTO DENKO CORP |
发明人 |
ODA TAKASHI;MORITA KOSUKE;TOYODA HIDESHI |
分类号 |
H01L21/56;C09J7/02;C09J11/04;C09J11/08;C09J121/00;C09J161/04;C09J163/00;H01L23/12 |
主分类号 |
H01L21/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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