发明名称 PLASMA GUN AND PLASMA PROCESSING APPARATUS HAVING THE SAME
摘要 PURPOSE: A plasma gun and a plasma processing apparatus are provided to improve a life time of a plasma gun by being able to emit high density thermal electron and by being able to apply the minimum heat source required for thermal electron emission. CONSTITUTION: A plasma gun(130) includes a housing(131), an electrode(132), and a gas supply unit(133). The housing includes a first end unit including an opening and a second end unit in the opposite side of the first end unit. The electrode is arranged in the housing and includes a first side facing the first end unit, a second side in the opposite side of the first side and an outer surface connecting the first side and the second side. The electrode supplies power and performs main discharge through the opening between the electrode and the anode. The gas supply unit supplies gas for plasma generation into the housing. The electrode forms the area of the first side to be greater than the cross-sectional area of the housing.
申请公布号 KR101254485(B1) 申请公布日期 2013.04.19
申请号 KR20110103934 申请日期 2011.10.12
申请人 TES CO., LTD. 发明人 KO, HEE JIN
分类号 H05H1/34;C23C14/32 主分类号 H05H1/34
代理机构 代理人
主权项
地址