| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an imprint method that can perform a high-throughput pattern transfer with less defect while achieving long life of a template. <P>SOLUTION: In an imprint method of an embodiment, a resist layer is formed on a processing target film on a substrate. Resist droplets are dropped at a position on the substrate to which a pattern outside region as being region located further outside than a template pattern comes close when a template is pressed against the substrate. Thereafter, the template is brought near the resist layer and the pattern outside region is pressed against the resist droplets. Further, protruded parts of the template pattern are inserted to an intermediate depth in the resit layer until a gap between recessed parts of the template pattern and the resist layer reaches a predetermined distance without any contact between the recessed parts of the template pattern and the resist layer. Thereafter, the resist layer is cured. <P>COPYRIGHT: (C)2013,JPO&INPIT |
