发明名称 |
METHOD FOR PRODUCING Beta-GA2O3 SUBSTRATE AND METHOD FOR PRODUCING CRYSTAL LAMINATE STRUCTURE |
摘要 |
<p>Provided are: a method for producing a beta-Ga2O3 substrate of which changes in donor concentration in a reducing atmosphere or an inert gas atmosphere are suppressed; and a method for producing a crystal laminate structure that can epitaxially grow a high-quality crystal film having low variability of quality in a reducing atmosphere or an inert gas atmosphere. The method for producing a beta-Ga2O3 substrate includes a step for cutting out a beta-Ga2O3 substrate from a beta-Ga2O3 crystal containing a group IV element; annealing processing in an atmosphere containing a reducing atmosphere and/or an inert gas atmosphere is performed on the beta-Ga2O3 crystal before cutting out the beta-Ga2O3 substrate, or on the cut-out beta-Ga2O3 substrate.</p> |
申请公布号 |
WO2013054919(A1) |
申请公布日期 |
2013.04.18 |
申请号 |
WO2012JP76523 |
申请日期 |
2012.10.12 |
申请人 |
TAMURA CORPORATION;KOHA CO., LTD. |
发明人 |
MASUI, TAKEKAZU;YAMAOKA, YU |
分类号 |
C30B29/16;C30B33/02;H01L21/20 |
主分类号 |
C30B29/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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