| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad having improved dressing properties while hardness is maintained. <P>SOLUTION: The polishing pad has a polishing layer formed of a polyurethane resin foam containing closed cells. The polyurethane resin foam contains, as starting material components, (A) an isocyanate component, (B) a polyol component, and (C) aromatic compound that has one hydroxyl group and/or an aromatic compound that has one amino group. <P>COPYRIGHT: (C)2013,JPO&INPIT |
