PLASMA APPARATUS AND SUBSTRATE-PROCESSING APPARATUS

摘要

The present invention provides a plasma-generating apparatus and a substrate-processing apparatus. The plasma-generating apparatus comprises: a plurality of dielectric tubes installed respectively in a plurality of through-holes formed in a vacuum chamber; antennas, which are divided into a first group and a second group based on the symmetrical disposition thereof in the vacuum chamber, and which are mounted on the outsides of the dielectric tubes, respectively; a first RF power source for supplying power to the first group of antennas; a second RF power source for supplying power to the second group of antennas; and a first power distribution unit, disposed between the first group of antennas and the first RF power source, for distributing power from the first RF power source to the first group of antennas.