| 摘要 |
<p>To provide an induction heating apparatus that employs a batch-type heating system for heating a large-diameter wafer and can perform uniform heating with a high precision, an induction heating apparatus (10) that heats an inductive-heating target member using a magnetic flux generated from a solenoid-type induction heating coil (18) and heats a wafer (40) using the heat generated from the inductive-heating target member, wherein a plurality of inductive-heating target members 14 (14a, 14b, and 14c) of which principal surface is arranged perpendicularly to a core axis direction of the induction heating coil (18) are interspersed. In the induction heating apparatus (10) described above, a susceptor (12) may be configured by housing the inductive-heating target member (14) in a single holder (16) made of a member having magnetic permeability and heat conductivity.</p> |
