| 发明名称 |
COMPOSITION AND ANTI-REFLECTIVE COATING FOR PHOTOLITHOGRAPHY |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for photolithography. <P>SOLUTION: The composition contains a polymer composed of a polymer containing the following A and a polymer formed from silane; wherein A is a structural unit 1 represented by formula (1) (in the formula, L is a C-C bond; and M is a divalent bonding group; having a group selected from an oxygen-containing group and halide on Si). <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2013067799(A) |
申请公布日期 |
2013.04.18 |
| 申请号 |
JP20120208064 |
申请日期 |
2012.09.21 |
| 申请人 |
DOW GLOBAL TECHNOLOGIES LLC;ROHM & HAAS ELECTRONIC MATERIALS LLC |
发明人 |
RAO YUANQIAO;AUGER ROBERT L;KIARIE CECILIA W;SRIVASTAVA YASMIN N;SULLIVAN CHRISTOPHER P |
| 分类号 |
C08L43/04;C08F30/08;C08G77/12;C08G77/14;C08J7/04;C08L83/04;G03F7/11 |
主分类号 |
C08L43/04 |
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